According to a report from TechNews, Christophe Fouquet, the CEO of ASML, announced that Intel's second high-NA EUV system has been completely assembled. Christophe Fouquet stated that the High-NA EUV machine is less likely to face delivery delays compared to the current standard EUV machines bec...

According to a report by the Economic Daily News, TSMC's first high numerical aperture extreme ultraviolet lithography (High-NA EUV) equipment will arrive this month, aiding the company in progressing its advanced process technology. Regarding these rumors, ASML stated on September 9 that it doe...

TSMC, along with research teams like imec, continues to push the boundaries in pursuit of optimal solutions for achieving high bandwidth and low power consumption on the same chip area. As per a report from Commercial Times, Imec has even mapped out a blueprint for the Angstrom era, with the pote...

According to a report from South Korean media outlet BusinessKorea citing sources, Samsung Electronics is said to be planning to reduce its procurement of ASML's next-generation Extreme Ultraviolet (EUV) lithography equipment. Additionally, their joint plan to build a research and development cente...

Per a report from Reuters, Intel is said to be receiving the second new High-NA EUV equipment from ASML, costing EUR 350 million (~USD 383 million). According to Intel's earnings call on August 1, CEO Pat Gelsinger stated that Intel began receiving the first large equipment in December, and the i...