According to The Korea Economic Daily, Samsung is reportedly set to receive its first high-numerical-aperture (high-NA) EUV scanner — the Twinscan EXE:5200B — later this year, followed by a second unit in the first half of 2026. While the company already operates a research-use high-NA EUV tool ...

According to its press release, imec announced a leadership transition, appointing Patrick Vandenameele as its next CEO effective April 2026, while sharpening its focus on the rising demands of AI chipmaking. At the same time, the institute reported breakthroughs in single-patterning High-NA EUV lit...

Despite warning that geopolitical risks could stall revenue growth in 2026, ASML still expects strong demand for both EUV and DUV tools this year. In its latest earnings call, the Dutch chipmaking equipment giant announced it has shipped the first EXE:5200 — a next-gen High-NA EUV system geared fo...

According to South Korean media outlet ETNews, both the U.S. and Japan are actively working to introduce extreme ultraviolet (EUV) lithography equipment into public-private research institutes through government-led initiatives. In contrast, South Korea’s government-driven efforts in this area rem...

According to a report from Wccftech, an unnamed Intel director states on the investment research platform Tegus, then shared by Tech Fund on X, that future high-end chip manufacturing will rely less on advanced lithography tools and more on etching technology. As indicated by the report, the directo...