According to a report from South Korean media outlet BusinessKorea citing sources, Samsung Electronics is said to be planning to reduce its procurement of ASML's next-generation Extreme Ultraviolet (EUV) lithography equipment. Additionally, their joint plan to build a research and development cente...

Per a report from Reuters, Intel is said to be receiving the second new High-NA EUV equipment from ASML, costing EUR 350 million (~USD 383 million). According to Intel's earnings call on August 1, CEO Pat Gelsinger stated that Intel began receiving the first large equipment in December, and the i...

As the semiconductor industry continues to advance, it has sparked an arms race among Samsung, Intel, and TSMC in acquiring extreme ultraviolet (EUV) equipment. When asked about when TSMC would adopt the extremely expensive High Numerical Aperture EUV (High-NA EUV) lithography equipment, as per a re...

Semiconductor equipment giant ASML plans to launch Hyper-NA Extreme Ultraviolet (EUV) machines by 2030, signaling the advent of the Angstrom era for semiconductor processes below 1 nanometer. However, according to a report from The Chosun Daily, the high cost of this equipment may cause TSMC, Samsu...

Intel's early adoption of ASML's High Numerical Aperture Extreme Ultraviolet Lithography (High-NA EUV) equipment is seen by many as a crucial move for Intel to reclaim its technological leadership. Yet, according to a report from CNA, industry sources cited in the report have warned that the high co...