Intel is continuing efforts to advance its foundry business and has reached another milestone with equipment supplied by Dutch lithography toolmaker ASML. According to a recent blog post from the company, Intel and ASML have completed “acceptance testing” on the first second-generation High-NA E...

While China is racing to close the lithography gap with homegrown tools from Huawei-linked SiCarrier and Yuliangsheng, the reality is that extreme ultraviolet (EUV) lithography remains an entirely different universe. Machines capable of printing sub-5nm chips are not just complex—they’re the pin...

According to The Korea Economic Daily, Samsung is reportedly set to receive its first high-numerical-aperture (high-NA) EUV scanner — the Twinscan EXE:5200B — later this year, followed by a second unit in the first half of 2026. While the company already operates a research-use high-NA EUV tool ...

According to its press release, imec announced a leadership transition, appointing Patrick Vandenameele as its next CEO effective April 2026, while sharpening its focus on the rising demands of AI chipmaking. At the same time, the institute reported breakthroughs in single-patterning High-NA EUV lit...

Despite warning that geopolitical risks could stall revenue growth in 2026, ASML still expects strong demand for both EUV and DUV tools this year. In its latest earnings call, the Dutch chipmaking equipment giant announced it has shipped the first EXE:5200 — a next-gen High-NA EUV system geared fo...