Subject


EUV


2025-07-02

[News] U.S., Japan Lead Government-Backed EUV Push as South Korea Reportedly Lags

According to South Korean media outlet ETNews, both the U.S. and Japan are actively working to introduce extreme ultraviolet (EUV) lithography equipment into public-private research institutes through government-led initiatives. In contrast, South Korea’s government-driven efforts in this area rem...

2025-06-23

[News] ASML’s High-NA EUV May Play a Smaller Role in Future Chipmaking, Intel Director Reportedly Claims

According to a report from Wccftech, an unnamed Intel director states on the investment research platform Tegus, then shared by Tech Fund on X, that future high-end chip manufacturing will rely less on advanced lithography tools and more on etching technology. As indicated by the report, the directo...

2025-06-03

[News] China’s AMEC Reportedly Saw Plasma Etching Grow at 50% CAGR, Backs 5nm Without EUV

As U.S. chip export controls tighten, China is fast-tracking its push for semiconductor self-sufficiency. Alongside Naura Technology and Huawei-linked SiCarrier, etching equipment leader AMEC is also rising rapidly. According to local media Science and Technology Innovation Express News, from 2019 t...

2025-05-16

[News] Samsung Reportedly Revises High-NA EUV Plans: Limited Memory Use, Foundry Begins at 1.4nm

According to South Korean media outlet The Bell, Samsung Electronics and SK hynix are reportedly delaying the adoption of ASML’s high-NA EUV lithography equipment in their DRAM production, citing the steep cost of the tools and upcoming shifts in DRAM architecture. 3D DRAM Architecture Won’t ...

2025-04-21

[News] Samsung and ASML Reportedly Scrap EUV Research Center in Hwaseong, Eyeing New Alternatives

As EUV machines are now essential for pushing sub-2nm chips into mass production in the angstrom era, partnerships with ASML remain a key industry focus. However, according to etnews, ASML and Samsung appear to have dropped plans for their joint EUV research center in Hwaseong, as ASML has begun sel...

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