According to Tom’s Hardware, citing Cosmos, Johns Hopkins University researchers have proposed “beyond-EUV (B-EUV),” a step beyond today’s industry-standard EUV lithography. The method employs 6.5–6.7nm soft X-ray lasers, which the report notes could enable resolutions down to 5nm and belo...

According to The Elec, citing industry sources, Samsung is outsourcing the production of photomasks — vital components in chipmaking — for the first time. As the report indicates, Samsung is said to be outsourcing lower-end photomasks for memory chips, signaling a strategy to channel resources ...

As China pushes through semiconductor independence by ramping up domestic AI chips to counter NVIDIA, the country is reportedly taking another major step toward self-reliance as SMIC is said to be testing a deep-ultraviolet (DUV) lithography machine developed by local start-up Yuliangsheng, as revea...

SK hynix announced on September 3 that it has installed a High NA EUV lithography system at its M16 fab in Icheon, South Korea, and held a ceremony to mark the system’s assembly. The machine introduced is ASML’s TWINSCAN EXE:5200B, the first High NA EUV model designed for volume production, a...

As SiCarrier advances chipmaking tools for 5nm production amid China’s semiconductor self-reliance push, Tsinghua University has reportedly achieved a breakthrough in EUV lithography materials. Researchers have developed a new polytellurium oxane-based photoresist, opening up fresh design strategi...