In late February, Micron announced in a press release that it had delivered 1γ (gamma) DDR5 samples to customers like Intel and AMD, becoming the first in the memory sector to do so. Notably, according to Chosun Biz, Micron applied EUV equipment to only one layer in the sample. The report sugges...

Has China already made striking breakthrough amid U.S. chip export curbs? According to TechPowerUp, China’s homegrown EUV lithography may longer be a distant goal, as a new system is currently being tested at Huawei's Dongguan facility. The information was first revealed by famous tech Twitter ...

Though Intel plans to lower its 2025 capex to USD 20 billion from USD 24 billion in 2024, the semiconductor giant has been gearing up to receive its new high-NA EUV machine soon. According to a report from Dutch media outlet tweakers, the first modules of ASML’s TwinScan EXE:5200 will be delivered...

According to reports, the Lawrence Livermore National Laboratory (LLNL) in the United States is developing a petawatt-level laser based on the element thulium. This laser is said to have the potential to improve the efficiency of extreme ultraviolet (EUV) lithography light sources by approximately t...

As semiconductor giants Intel and TSMC have been bringing in ASML’s High- NA EUV machines, how major South Korean chip companies approach extreme ultraviolet (EUV) lithography technology also comes into spotlight. Interestingly, Samsung and SK hynix are adopting differing strategies on EUV, as per...