[News] TSMC’s EUV Program Cuts Peak Power 44%, Projected to Save US$22.4M by 2030

As noted by Tom’s Hardware, TSMC, the world’s largest foundry, consumes about 9% of Taiwan’s total electricity. To help curb this demand, the company has collaborated with suppliers on the “EUV Dynamic Energy Saving Program.” A pilot run showed the initiative can cut an EUV tool’s annual power use by roughly 8%.

By 2030, the program is projected to save a cumulative 190 million kWh. From an economic perspective, at a rate of NT$3.78 per kWh, these savings are expected to reduce TSMC’s costs by about US$22.44 million, as TechNews indicates.

Notably, TSMC has achieved a 44% reduction in instantaneous power consumption through the program in 2024, according to its website.

While the program has already delivered meaningful results, TechNews, citing Tom’s Hardware, points out that only 46.1% of TSMC’s electricity consumption comes from fab tools, with about 53.9% consumed by supporting systems. This suggests there is still considerable room to further improve overall efficiency.

Global Rollout and Expansion

By the end of this year, the system will be fully deployed across all of TSMC’s EUV machines worldwide. Since September 2025, the program has been progressively implemented at Fab 15B, Fab 18A, and Fab 18B.

TechNews adds that the company plans to set this energy-saving program as a baseline requirement for all future fabs. For instance, Phase 2 of Fab 21 in Arizona, along with subsequent installations, will be required to adopt the energy-saving standard.

Beyond dynamic energy-saving measures for EUV lithography tools, TSMC is also exploring similar applications in Deep Ultraviolet (DUV) systems and other module equipment beyond lithography.

From Automation to Adaptive Power Control

As part of the initiative, the company integrates control mechanisms with its fab automation system to align with production needs, cutting energy use while sustaining stable output, according to its website.

Expanding on this, Tom’s Hardware notes that the program could function through adaptive power scaling tied to real-time operating conditions. For instance, when no wafers are queued for processing, an EUV tool could automatically pause or switch into a low-power mode rather than continuously drawing full power.

Read more

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(Photo credit: TSMC)